SEM

Scanning electron microscopy is used to create an image of a surface by recording signals arising from the interaction of a high energy focused beam of electrons with the sample surface.

Capability

Secondary electron and backscattered electron imaging to 3.5 nm resolution at 30 keV, magnification to x300,000, sample size up to 150 mm wafer, tilt from -10° to 90°.
Secondary electron imaging to 2 nm resolution at 20 keV, under optimum conditions to 4 nm at 1 keV, magnification to x900,000, sample size up to 150 mm wafer.

Equipment

JEOL JSM 6060 SEM
Raith 150 e-beam writer with a Gemini electron beam column

Example

SEM image of carbon nanotubes obtained with
the Raith 150 e-beam writer.